Pure Water Heating Device "HDW III"
A pure water heating device suitable for hot deionized water cleaning of silicon substrates and hot deionized water lift drying!
The "HDW III" is a device used for the cleaning of ultra-pure water in semiconductor manufacturing processes, solar cell manufacturing processes, and glass substrates in liquid crystal manufacturing processes. It non-contactly heats the water using a carbon heater within a quartz glass container. It features stable temperature control within ±1° through PID control and can achieve a temperature rise from startup to operating temperature in under 120 seconds. Additionally, it accommodates a wide range of flow rates and temperatures, allowing for temperature adjustments in response to flow rate changes. 【Features】 ■ Clean heating ■ High efficiency and energy-saving ■ High-performance temperature adjustment ■ A comprehensive lineup tailored to the usage flow rate *For more details, please download the PDF or contact us.
- Company：ワイエイシイメカトロニクス つくば事業所 PV事業部
- Price：Other
